China Develops EUV Machine Prototype with Former ASML Collaborators

China Creates EUV Lithography Machine Prototype

A report from Reuters indicates that scientists in China have developed a prototype of a machine intended for the production of semiconductor chips for artificial intelligence. The team in Shenzhen finalized the prototype of an extreme ultraviolet (EUV) lithography machine earlier this year, which is currently in the testing phase. The device was built by engineers who previously worked for the Dutch semiconductor supplier ASML.

The EUV is a complex technology essential for the manufacturing of chips used by companies like Intel and TSMC. It is necessary for competition in this industry, making access to EUV machines a crucial factor. Although the Chinese prototype does not yet produce chips, sources say it is able to generate the extreme ultraviolet light needed for the manufacturing process.

Impact of EUV Lithography Technology

If this information is confirmed, China may dominate this technological sector sooner than expected. So far, EUV technology has been restricted by Western companies and used as a bargaining chip by the U.S. government. Chinese President Xi Jinping emphasizes the importance of self-sufficiency in semiconductor production in the country. One source told Reuters: "The goal is for China to eventually manufacture advanced chips with machines wholly made in the country. The intent is to completely push the United States out of its supply chains."

With this development, China may accelerate its competitiveness in the global technology sector and present new challenges to the hegemony of Western powers in the semiconductor supply chain.